Episil Epitaxial Services are the largest epitaxial foundries in Taiwan. State-of-the-art production platforms are used in our process developments and manufacturing services to offer our customers a wide range of process capabilities. Supporting all kinds of application including CMOS, BiCMOS, POWER MOSFET Device and Discrete Device.

Wafer Diameters  4”, 5”, 6”, 8”

Epitaxial Layer Dopant Gas  B2H6, AsH3, PH3

Epitaxial Structure

Single Layer : N/N, P/P, P/N…. Multiple Layer: N/N/N, N/N/P, N/P/P, P/P/P, P/P/N, P/N/N, N/P/N… Buried Layer: N/BL/P, P/BL/P…

Reactor Types

Gemini Ⅱ Gemini Ⅲ Toshiba GX ASM Epsilon 2000 AMAT Centura

Epitaxial Capability

Single Wafer Reactor Batch Reactor Range of Thichness 1.0 um ～ 20 um 1.0 um～200 um Range of Resistivity 0.15 ohm-cm～150 ohm-cm 0.15 ohm-cm～200 ohm-cm